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Crystallinity and microstructure in Si films grown by plasma-enhanced chemical vapor deposition: A simple atomic-scale model validated by experiments

Document Type

Article

Author

Novikov, P.L.; Le Donne, A.; Cereda, S.; Miglio, L.; Pizzini, S.; Binetti, S.; Montalenti, F.; Rondanini, M.; Cavallotti, C.; Chrastina, D.; Moiseev, T.; Von Känel, H.; Isella, G.

Source

In: Applied Physics Letters. (Applied Physics Letters, 2009, 94(5))

Subject

Language

English

ISSN

00036951

Online Access

Full Text (AIP) Web of Science JCR 저널정보 Scopus Find it@PNU

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