학술논문
An Advanced chemically amplified resist
Document Type
Conference Paper
Source
In: Proceedings of SPIE - The International Society for Optical Engineering , Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX. (Proceedings of SPIE - The International Society for Optical Engineering, 1 May 1990, 1263:330-342)
Subject
Language
English
ISSN
1996756X
0277786X
0277786X