학술논문
Correlation between volume fraction of silicon clusters in amorphous silicon films and optical emission properties of Si* and SiH*
Document Type
Conference Paper
Author
Source
In: Japanese Journal of Applied Physics , Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials. (Japanese Journal of Applied Physics, November 2013, 52(11 PART 2))
Subject
Language
English
ISSN
00214922
13474065
13474065