학술논문
Non-CA resists for 193 nm immersion lithography: Effects of chemical structure on sensitivity
Document Type
Conference Paper
Author
Source
In: Proceedings of SPIE - The International Society for Optical Engineering , Advances in Resist Materials and Processing Technology XXVI. (Proceedings of SPIE - The International Society for Optical Engineering, 2009, 7273)
Subject
Language
English
ISSN
0277786X