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Effective passivation of silicon surfaces by ultrathin atomic-layer deposited niobium oxide

Document Type

Article

Author

Macco, B.; Deijkers, J.H.; Basuvalingam, S.B.; Black, L.E.; Melskens, J.; Van De Loo, B.W.H.; Berghuis, W.J.H.; Kessels, W.M.M.; Bivour, M.; Hermle, M.

Source

In: Applied Physics Letters. (Applied Physics Letters, 11 June 2018, 112(24))

Subject

Language

English

ISSN

00036951

Online Access

Full Text (AIP) Web of Science JCR 저널정보 Scopus Find it@PNU

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