학술논문
7.4 nm linewidth Pt nanowires by electron-beam lithography using non-chemically amplified positive-tone resist and post-exposure bake
Document Type
Article
Author
Source
In: Japanese Journal of Applied Physics . (Japanese Journal of Applied Physics, 1 April 2024, 63(4))
Subject
Language
English
ISSN
13474065
00214922
00214922