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Self-heating induced instability of oxide thin film transistors under dynamic stress

Document Type

Article

Author

Kise, K.; Fujii, M.N.; Urakawa, S.; Yamazaki, H.; Ishikawa, Y.; Uraoka, Y.; Kawashima, E.; Tomai, S.; Yano, K.; Wang, D.; Furuta, M.

Source

In: Applied Physics Letters. (Applied Physics Letters, 11 January 2016, 108(2))

Subject

Language

English

ISSN

00036951

Online Access

Full Text (AIP) Web of Science JCR 저널정보 Scopus Find it@PNU

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