학술논문
Fast diffusion in Germanium and silicon investigated by lamp-based rapid thermal annealing
Document Type
Article
Author
Source
In: Rapid Thermal Processing and Beyond: Applications in Semiconductor Processing - Selected papers from RTP specialists all over the world . (Materials Science Forum, 2008, 573-574:35-43)
Subject
Language
English
ISSN
16629752
02555476
02555476