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Green deep-UV photoresist based on chitosan for microelectronics

Document Type

Article

Author

Sysova, O.; Berling, D.; Soppera, O.; Durin, P.; Leclercq, J.-L.; Chevolot, Y.; Gablin, C.; Léonard, D.; Téolis, A.; Trombotto, S.; Delair, T.; Servin, I.; Tiron, R.; Bazin, A.

Source

In: Journal of Applied Polymer Science. (Journal of Applied Polymer Science, 20 August 2023, 140(32))

Subject

Language

English

ISSN

10974628
00218995

Online Access

Full Text (Wiley Journals) Full Text (Wiley-DB) Web of Science JCR 저널정보 Scopus Find it@PNU

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