학술논문
Fabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers
Document Type
Article
Author
Source
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures . (Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, March/April 1997, 15(2):293-298)
Subject
Language
English
ISSN
10711023