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Comparison of aluminum nitride thin films prepared by magnetron sputter epitaxy in nitrogen and ammonia atmosphere

Document Type

Article

Author

Sundarapandian, B.; Kirste, L.; Straňák, P.; Prescher, M.; Nair, A.; Raghuwanshi, M.; Tran, D.Q.; Darakchieva, V.; Paskov, P.P.; Graff, A.; Ambacher, O.

Source

In: Applied Physics Letters. (Applied Physics Letters, 29 April 2024, 124(18))

Subject

Language

English

ISSN

00036951

Online Access

Full Text (AIP) Web of Science JCR 저널정보 Scopus Find it@PNU

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