학술논문

Mask technology for EUV lithography

Document Type

Article

Author

Bujak, M.; Burkhart, S.; Cerjan, C.; Kearney, P.; Moore, C.; Prisbrey, S.; Sweeney, D.; Tong, W.; Vernon, S.; Walton, C.; Warrick, A.; Weber, F.; Wedowski, M.; Wilhelmsen, K.; Bokor, J.

Source

In: Proceedings of SPIE - The International Society for Optical Engineering. (Proceedings of SPIE - The International Society for Optical Engineering, 1999, 3665:30-39)

Subject

Language

English

ISSN

0277786X

Online Access

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