학술논문
Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold
Document Type
Article
Author
Makhotkin, I.A.; Milov, I.; Sturm, J.M.; Nikolaev, K.V.; Van De Kruijs, R.W.E.; Louis, E.; ChalupskÝ, J.; Juha, L.; HÁJkovÁ, V.; Vozda, V.; Sburian, T.; Saksl, K.; Tiedtke, K.; Faatz, B.; Keitel, B.; PlÖNjes, E.; Schreiber, S.; Toleikis, S.; Loch, R.; Enkisch, H.; Hermann, M.; Strobel, S.; De Vries, G.; Donker, R.; Scholze, F.; Siewert, F.; Smithers, M.A.; Van Wolferen, H.A.G.M.; Keim, E.G.; Jacyna, I.; Jurek, M.; Klinger, D.; Pelka, J.B.; Sobierajski, R.; Mey, T.
Source
In: Journal of the Optical Society of America B: Optical Physics . (Journal of the Optical Society of America B: Optical Physics, 1 November 2018, 35(11):2799-2805)
Subject
Language
English
ISSN
15208540
07403224
07403224