학술논문
Enhancement of XeF2 -assisted gallium ion beam etching of silicon layer and endpoint detection from backside in circuit editing
Document Type
Article
Author
Source
In: Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics . (Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 1 November 2015, 33(6))
Subject
Language
English
ISSN
21662754
21662746
21662746