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Micro-transfer-printed narrow-linewidth III-V-on-Si double laser structure with a combined 110 nm tuning range

Document Type

Article

Author

Soltanian, E.; Wang, D.; Kuyken, B.; Zhang, J.; Roelkens, G.; Muliuk, G.; Lepage, G.; Verheyen, P.; van Campenhout, J.; Uvin, S.; Ertl, S.; Rimböck, J.; Vaissiere, N.; Néel, D.; Ramirez, J.; Decobert, J.

Source

In: Optics Express. (Optics Express, 24 October 2022, 30(22):39329-39339)

Subject

Language

English

ISSN

10944087

Online Access

Full Text (OSA) Open Access (EBSCO) Web of Science JCR 저널정보 Scopus Find it@PNU

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