학술논문
Comparative study of two negative CAR resists EN-024M and NEB 31
Document Type
Conference Paper
Author
Source
In: Proceedings of SPIE - The International Society for Optical Engineering , Photomask and Next-Generation Lithography Mask Technology XI. (Proceedings of SPIE - The International Society for Optical Engineering, 2004, 5446(PART 1):171-182)
Subject
Language
English
ISSN
0277786X