학술논문
Magnetic field optimization in a dielectric magnetically enhanced reactive ion etch reactor to produce an instantaneously uniform plasma
Document Type
Article
Author
Source
In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films . (Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1998, 16(3):1600-1603)
Subject
Language
English
ISSN
07342101