학술논문
Evaluation of the change in photoresist sidewall roughness due to electron beam-induced shrinkage using atomic force microscopy
Document Type
Article
Author
Source
In: Journal of Micro/Nanopatterning, Materials and Metrology . (Journal of Micro/Nanopatterning, Materials and Metrology, 1 October 2023, 22(4))
Subject
Language
English
ISSN
27088340