학술논문
The effect of non-reactive ions on the properties of PECVD (plasma enhanced chemical vapor deposition) TEOS (tetraethoxysilane) oxides
Document Type
Article
Author
Source
In: Pure and Applied Chemistry . (Pure and Applied Chemistry, 1 January 1990, 62(9):1757-1760)
Subject
Language
English
ISSN
13653075
00334545
00334545