학술논문
Double-patterning requirements for optical lithography and prospects for optical extension without double patterning
Document Type
Article
Author
Source
In: Journal of Micro/Nanolithography, MEMS, and MOEMS . (Journal of Micro/Nanolithography, MEMS, and MOEMS, 2009, 8(1))
Subject
Language
English
ISSN
19325134
19325150
19325150