학술논문
Double patterning requirements for optical lithography and prospects for optical extension without double patterning
Document Type
Conference Paper
Author
Source
In: Proceedings of SPIE - The International Society for Optical Engineering , Optical Microlithography XXI. (Proceedings of SPIE - The International Society for Optical Engineering, 2008, 6924)
Subject
Language
English
ISSN
0277786X