학술논문
Rigorous 3D probabilistic computational lithography and chip-level inspection for EUV stochastic failure detection
Document Type
Conference Paper
Author
Kim, E.; Kim, W.; Lee, J.; Kim, S.; Lee, S.; Kwak, N.; Kang, M.; Jeong, Y.; Hwang, M.; Park, C.; Koo, K.; Jeong, S.; Biafore, J.; Smith, M.; Graves, T.; Burov, A.; Vukkadala, P.; Parsey, G.; Zhang, C.; Bai, K.; Krek, J.; Higgins, C.; Bakarian, S.; Ko, K.; Gronheid, R.; Sah, K.; Cross, A.; Liu, Y.; Pret, A.V.; Walker, C.; Tolani, V.; Hwa, G.; Hu, P.; Chang Song; Arkhipov, A.; Bouckou, L.; Liu, C.-P.; Yang, X.; O Hara, K.; Son, D.
Source
In: Proceedings of SPIE - The International Society for Optical Engineering , International Conference on Extreme Ultraviolet Lithography 2023. (Proceedings of SPIE - The International Society for Optical Engineering, 2023, 12750)
Subject
Language
English
ISSN
1996756X
0277786X
0277786X