학술논문
Sub k1 = 0.25 lithography with double patterning technique for 45nm technology node flash memory devices at λ = 193nm
Document Type
Conference Paper
Author
Source
In: Proceedings of SPIE - The International Society for Optical Engineering , Optical Microlithography XX. (Proceedings of SPIE - The International Society for Optical Engineering, 2007, 6520(PART 2))
Subject
Language
English
ISSN
0277786X