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Effect of films thickness and hydrogen annealing on passivation performance of plasma ALD based Hafnium oxide films

Document Type

Article

Author

Devi, M.; Tomer, S.; Pathi, P.; Vandana

Source

In: Physica Scripta. (Physica Scripta, 1 May 2024, 99(5))

Subject

Language

English

ISSN

14024896
00318949

Online Access

Full Text (IOP Science) Full Text (IOP) Web of Science JCR 저널정보 Scopus Find it@PNU

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