학술논문
65 nm Device manufacture using shaped E-Beam lithography
Document Type
Conference Paper
Author
Pain, L.; Jurdit, M.; Brun, P.; Laplanche, Y.; Leininger, H.; Tourniol, S.; Faure, R.; Bossy, X.; Palla, R.; Beverina, A.; Judong, F.; Brosselin, K.; Depoyan, L.; Le Friec, Y.; Leverd, F.; Josse, E.; Hinsinger, O.; Henry, D.; Arnaud, F.; Todeschini, J.; Broekaart, M.; De Jonghe, V.; Stolk, P.; Tavel, B.; Woo, M.
Source
In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers , Microprocesses and Nanotechnology. (Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, June 2004, 43(6 B):3755-3761)
Subject
Language
English
ISSN
00214922