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Plasma sputtering of biased electrodes in an oblique magnetic field

Document Type

Article

Author

Hiret, P.; Soni, K.; Steiner, R.; Marot, L.; Meyer, E.; Cherukulappurath Mana, A.; Faudot, E.; Moritz, J.; Brochard, F.; Heuraux, S.; Moser, L.; Geraldini, A.; Alberti, S.; Furno, I.

Source

In: Plasma Sources Science and Technology. (Plasma Sources Science and Technology, November 2023, 32(9))

Subject

Language

English

ISSN

13616595
09630252

Online Access

Full Text (IOP Science) Full Text (IOP) Web of Science JCR 저널정보 Scopus Find it@PNU

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