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CMOS compatible strategy based on selective atomic layer deposition of a hard mask for transferring block copolymer lithography patterns

Document Type

Article

Author

Gay, G.; Grampeix, H.; Martin, F.; Jalaguier, E.; De Salvo, B.; Baron, T.; Agraffeil, C.; Salhi, B.; Chevolleau, T.; Cunge, G.; Tortai, J.-H.

Source

In: Nanotechnology. (Nanotechnology, 29 October 2010, 21(43))

Subject

Language

English

ISSN

09574484
13616528

Online Access

Web of Science JCR 저널정보 Scopus Find it@PNU

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