학술논문

Selective area growth of high-density GaN nanowire arrays on Si(111)
Document Type
Conference
Source
2016 IEEE Photonics Society Summer Topical Meeting Series (SUM) Photonics Society Summer Topical Meeting Series (SUM), 2016 IEEE. :169-170 Jul, 2016
Subject
Components, Circuits, Devices and Systems
Computing and Processing
Photonics and Electrooptics
Gallium nitride
Aluminum nitride
III-V semiconductor materials
Shape
Molecular beam epitaxial growth
Substrates
Photoluminescence
GaN
nanowires
plasma-assisted molecular beam epitaxy
nanoimprint lithography
photoluminescence
Language
Abstract
Selective-area growth of high-density GaN nanowires on Si(111) substrate by plasma-assisted molecular beam epitaxy is studied. AlN nanopedestals used as nanowires growth seeds are fabricated by nanoimprint lithography. GaN nanowires with hexagonal cross-section show the best optical quality with a strong resonant emission at 3.457eV.