학술논문

Low-frequency noise in narrow channel MOSFETs
Document Type
Conference
Source
2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443) Solid-state and integrated circuit technology Solid-State and Integrated-Circuit Technology, 2001. Proceedings. 6th International Conference on. 2:1051-1053 vol.2 2001
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Low-frequency noise
MOSFET circuits
Fluctuations
Semiconductor device noise
Voltage
Temperature
Electron traps
Oxidation
Shape
Frequency
Language
Abstract
The characteristics of low-frequency (LF) noise in n-metal oxide semiconductor field effect transistors (n-MOSFET) with ultra-narrow channels have been investigated. LF noise spectra having both 1/f/sup n/ and Lorentzian type are found separately in the same narrow channel at different gate bias voltage, while only 1/f/sup n/ noise is observed in relative wide channels. Furthermore, random telegraph signals (RTSs) with very large amplitude are observed in the devices with narrow channels at room temperature. The observations strongly suggest that LF noise in weak inversion dominantly suffer from carrier mobility fluctuation rather than carrier number fluctuation in narrow channels.