학술논문
Automatic parameter control system for semiconductor structures manufacturing
Document Type
Conference
Author
Source
Proceedings of the Third International Workshop on Design of Mixed-Mode Integrated Circuits and Applications (Cat. No.99EX303) Design of mixed-mode integrated circuits and applications Design of Mixed-Mode Integrated Circuits and Applications, 1999. Third International Workshop on. :69-72 1999
Subject
Language
Abstract
This paper describes analysis of measurement equipment design concepts and some advances in our research regarding the construction of computer based facilities for electrical and non-electrical complex parameters measurements of semiconductor structures. CV- and GV-characteristics system has been designed and used for automatic parameter control of semiconductors production particularly for technological process control of the charge-coupled CCD device manufacturing. The proposed measuring system has been analyzed to estimate performance of semiconductor characteristics acquisition and processing. That information is used as a feedback action to improve a technological process of the CCD structure manufacturing.