학술논문

Calculations of Multipactor Growth in Rectangular Waveguides
Document Type
Periodical
Source
IEEE Transactions on Plasma Science IEEE Trans. Plasma Sci. Plasma Science, IEEE Transactions on. 47(2):1364-1371 Feb, 2019
Subject
Engineered Materials, Dielectrics and Plasmas
Fields, Waves and Electromagnetics
Radio frequency
Monte Carlo methods
Surface discharges
Rectangular waveguides
Electron emission
Discharges (electric)
Surface treatment
Monte Carlo
multipactor
pulsed power application
secondary electron emission
simulation
waveguide
Language
ISSN
0093-3813
1939-9375
Abstract
Multipactor growth in rectangular waveguides is probed based on a kinetic approach. Unlike most studies relying on the Vaughan model, a probabilitic approach for random multiple secondary particle emissions is used. Spread in electron emission velocities, the angular dependence of secondary emission yields, and an external radio frequency (RF) driving field due to a TE10 mode, were all built in. The calculations predict the secondary emission yield for copper, probe the population growth dynamics, and obtain the susceptibility diagram. Despite a maximum field at the waveguide center from the RF excitation, maximum electron densities are predicted at locations symmetrically displaced from the center. The secondary electron yield (SEY) characteristics, its local maxima, and the role of oblique incident angles, collectively lead to multipactor finding its place at off-center locations.