학술논문

A monolithic PDMS waveguide system fabricated using soft-lithography techniques
Document Type
Periodical
Source
Journal of Lightwave Technology J. Lightwave Technol. Lightwave Technology, Journal of. 23(6):2088-2093 Jun, 2005
Subject
Communication, Networking and Broadcast Technologies
Photonics and Electrooptics
Optical waveguides
Optical attenuators
Robustness
Temperature sensors
Humidity
Optical losses
Insertion loss
Frequency
Microfluidics
Costs
Micro-total-analysis systems
poly(dimethyl siloxane)
soft lithography
waveguide
Language
ISSN
0733-8724
1558-2213
Abstract
A monolithic waveguide system using poly(dimethyl siloxane) (PDMS) was designed, fabricated, and characterized. The waveguide demonstrated good confinement of light and relatively low attenuation at 0.40 dB/cm. The robustness and handling properties of the completed waveguides were excellent, and the process yield exceeded 96%. The waveguide did exhibit moderate temperature and humidity sensitivity but no temporal variation, and insertion loss remained stable over extended periods of time. Applications of this waveguide system in microscale sensing are immense, judging by the frequency of use of PDMS as the substrate for microfluidic and biomedical systems. The monolithic nature of the waveguides also reduces their cost and allows integration of optical pathways into existing PDMS-based microsystems.