학술논문

The importance of contact injection in undoped AlGaAs/GaAs heterostructures
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 37(3):556-561 Mar, 1990
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Gallium arsenide
Electrons
Finite difference methods
Analytical models
MODFETs
HEMTs
Insulation
FETs
Geometry
Graphics
Language
ISSN
0018-9383
1557-9646
Abstract
A two-dimensional finite-difference analysis is used to simulate the current flow and charge distribution in undoped AlGaAs/GaAs MODFET structures called heterostructure insulated-gate field-effect transistors (HIGFETs). How an electron channel can be induced at the AlGaAs/GaAs interface when there is no doped supply layer is studied. The origins of the charge in this channel are studied by comparing its behavior in equilibrium with that when a current flows. By considering the different geometries of a Schottky gate and implanted source and drain contacts, the interrelationship between gate control and electron injection from the doped contact regions is shown and a graphic view of the origins of the interfacial charge in a HIGFET is given.ETX