학술논문

Raman measurements on GaN thin films for PV - purposes
Document Type
Conference
Source
2012 38th IEEE Photovoltaic Specialists Conference Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE. :000036-000038 Jun, 2012
Subject
Photonics and Electrooptics
Power, Energy and Industry Applications
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Molecular beam epitaxial growth
Silicon
Gallium nitride
Substrates
Raman scattering
material properties
semiconductor films
strain measurements
crystal microstructure
physical optics
Language
ISSN
0160-8371
Abstract
Raman scattering (RS) is a very important experimental tool to characterize the optical modes and another elementary excitations of materials. Among other issues it can determine for example the degree of crystalline quality and point defects like local modes. Therefore GaN - thin films and related compounds for photovoltaic purposes and as processed by several systems have been measured by this technique. The films were grown by Molecular Beam Epitaxy (MBE), Close Spaced Vapor Transport (CSVT) and Laser Ablation (LA) with the use of optimal growth parameters and substrates. Gallium nitride crystallizes in the wurtzite structure with 4 atoms in the unit cell and presents 7 allowed Raman modes of A 1 , E 1 , and E 2 symmetries. In this work we present and discussed our Raman experiments where particularly the detection of the E 2 and A 1 modes are illustrated in these nitride semiconductor compounds.