학술논문

Room-temperature continuous-wave operation of AlGaAs-GaAs single-quantum-well lasers on Si by metalorganic chemical-vapor deposition using AlGaAs-AlGaP intermediate layers
Document Type
Periodical
Source
IEEE Journal of Quantum Electronics IEEE J. Quantum Electron. Quantum Electronics, IEEE Journal of. 27(6):1798-1803 Jun, 1991
Subject
Engineered Materials, Dielectrics and Plasmas
Photonics and Electrooptics
Chemical lasers
Substrates
Quantum well lasers
MOCVD
Annealing
Morphology
Laser modes
Threshold current
Current density
Gallium arsenide
Language
ISSN
0018-9197
1558-1713
Abstract
The heterointerfaces of single quantum wells and the characteristics of single-quantum-well lasers on Si substrates grown with Al/sub 0.5/Ga/sub 0.5/As-Al/sub 0.55/Ga/sub 0.45/P intermediate layers entirely by metalorganic chemical-vapor deposition are reported. The effects of thermal cycle annealing on the crystallinity and lasing characteristics of GaAs-Si are also reported. Thermal cycle annealing is found to improve the crystallinity of GaAs-Si, and to contribute to room-temperature continuous-wave operations of lasers on Si substrates. By using the Al/sub 0.5/Ga/sub 0.5/As-Al/sub 0.55/Ga/sub 0/ intermediate layers, single quantum wells with a specular surface morphology and a smoother heterointerface can be grown on an Si substrate.ETX