학술논문

Demonstration of high-speed (Al,Ga)As/sub 0.51/Sb/sub 0.49//InP type-II uni-traveling carrier photodiodes for 1.55 /spl mu/m operation
Document Type
Conference
Source
International Conference on Indium Phosphide and Related Materials, 2005 Indium Phosphate and Related Materials Indium Phosphide and Related Materials, 2005. International Conference on. :144-147 2005
Subject
Engineered Materials, Dielectrics and Plasmas
Components, Circuits, Devices and Systems
Photonics and Electrooptics
Indium phosphide
Bandwidth
Gallium arsenide
Photodiodes
Electrons
Epitaxial growth
Fabrication
Dark current
Current measurement
Test equipment
Language
ISSN
1092-8669
Abstract
We demonstrate staggered ("type-II") lineup lattice-matched GaAs/sub 0.51/Sb/sub 0.49//InP uni-traveling carrier photodiodes (UTC-PDs) for application near 1.55 /spl mu/m. The GaAsSb absorbing layer conduction band edge lines up /spl Delta/E/sub C/=0.11 eV above that of InP, and hence allows the direct injection of photo-generated electrons into an InP collector-without any need for compositional grading around the GaAsSb/InP interface-thus simplifying epitaxial growth and device fabrication. InP/GaAsSb UTC-PDs show low dark current levels, and measurable bandwidths are limited by the test equipment. A transit-limited bandwidth of 105 GHz for a PD with a 1000 /spl Aring/ GaAsSb absorption layer (C:5/spl times/10/sup 18//cm/sup 3/) and a 2000 /spl Aring/ InP collector is inferred from the variation of photoresponse bandwidth with device area.