학술논문

Proton Irradiation Effects in MOCVD Grown β-Ga2O3 and ε-Ga2O3 Thin Films
Document Type
Periodical
Source
IEEE Transactions on Nuclear Science IEEE Trans. Nucl. Sci. Nuclear Science, IEEE Transactions on. 71(1):67-71 Jan, 2024
Subject
Nuclear Engineering
Bioengineering
Radiation effects
Films
Protons
Crystals
Surface morphology
MOCVD
Photodetectors
β-gallium oxide (Ga₂O₃)
ε-Ga₂O₃
metal–organic chemical vapor deposition (MOCVD)
photodetector
proton irradiation
Language
ISSN
0018-9499
1558-1578
Abstract
Gallium oxide (Ga2O3) with robust bonding is advantageous for space applications, but its radiation hardness dependent on the crystalline phases has not been reported yet. Herein, the proton irradiation effects on $\beta $ -Ga2O3 and $\varepsilon $ -Ga2O3 epitaxial films grown by metal–organic chemical vapor deposition (MOCVD) have been observed at 100 MeV with proton fluences up to $1\times 10^{{11}}$ cm $^{-{2}}$ . The film crystallinity, surface quality, optical property, and defect concentration were measured from Ga2O3 with and without proton irradiation. Additionally, the metal–semiconductor–metal (MSM)-type photodetectors were constructed on the non-irradiated and proton-irradiated $\beta $ -/ $\varepsilon $ -Ga2O3 thin films to investigate radiation damage of photodetection performance. Although the proton irradiation may generate some possible irradiation defects (such as self-trapped holes or vacancies) in Ga2O3 thin films to degrade their photoelectric properties, the $\beta $ -/ $\varepsilon $ -Ga2O3-based photodetectors could still detect the solar-blind light signal sensitively. $\beta $ -Ga2O3 and $\varepsilon $ -Ga2O3 are materials for semiconductor devices regarding future space applications for their favorable resistance to radiation.