학술논문

Raman spectroscopy study of low energy He+ ion irradiation effect in graphene transferred onto SiO2
Document Type
Conference
Source
2013 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013) Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on. :903-906 Aug, 2013
Subject
Bioengineering
Components, Circuits, Devices and Systems
Computing and Processing
Engineered Materials, Dielectrics and Plasmas
Engineering Profession
Fields, Waves and Electromagnetics
General Topics for Engineers
Nuclear Engineering
Photonics and Electrooptics
Power, Energy and Industry Applications
Robotics and Control Systems
Graphene
Radiation effects
Doping
Raman scattering
Chemicals
Substrates
Charge carrier processes
Language
ISSN
1944-9399
Abstract
We studied the low energy (5.4 keV) He + ion irradiation effect on the properties of chemical vapor deposited graphene transferred onto SiO 2 /Si substrate. For a small dose density of 4 × 1012 He + /cm2, both the G and 2D bands in the Raman spectra exhibit blue-shift and the intensity ratio of the 2D and G peaks decreases. The intensity ratio of the D and G peaks increases a lot as the dose density is larger than 1.2 × 10 13 He + /cm 2 . It suggests that before the formation of large amount of defects, low energy He + ion irradiation may induce charge-transfer doping in graphene due to the presence of polymer residues. Broad spatial distributions of the band shift and the intensity ratio indicate inhomogeneity of doping level in graphene.