학술논문

Cuprate trilayer c-axis tunnelling heterostructures
Document Type
Periodical
Source
IEEE Transactions on Applied Superconductivity IEEE Trans. Appl. Supercond. Applied Superconductivity, IEEE Transactions on. 5(2):1680-1683 Jun, 1995
Subject
Fields, Waves and Electromagnetics
Engineered Materials, Dielectrics and Plasmas
Tunneling
Titanium compounds
Atomic layer deposition
Immune system
Insulation
Bismuth compounds
Electrodes
Atomic beams
Molecular beam epitaxial growth
Phonons
Language
ISSN
1051-8223
1558-2515
2378-7074
Abstract
Trilayer tunneling structures consisting of cuprate electrodes and titanate barriers were grown by atomic layer-by-layer molecular beam epitaxy and processed into c-axis transport samples. Barriers of SrTiO/sub 3/ and related titanates with thicknesses ranging from 4 /spl Aring/ to 28 /spl Aring/ (one to seven unit cells of the titanate) were grown. While no supercurrent was observed for even the thinnest barrier, the zero bias resistance was an exponential function of barrier thickness for samples with five or fewer titanate unit cell barriers, indicating tunneling transport. Each additional titanate unit cell caused the zero bias resistance to increase by one order of magnitude. A detailed investigation of the properties of the cuprate layers immediately adjacent to the titanate layers revealed that they were depleted of charge carriers and exhibited variable range hopping transport. Thus the electron states in these layers were localized. The trilayer transport process is modeled as one phonon assisted tunneling between localized states.ETX