학술논문

Chemical Solution Deposition of MTiO3(M = Ca, Sr, and Ba) Based Buffer Layer Prior to Coated Conductors Architectures
Document Type
Periodical
Source
IEEE Transactions on Applied Superconductivity IEEE Trans. Appl. Supercond. Applied Superconductivity, IEEE Transactions on. 33(5):1-5 Aug, 2023
Subject
Fields, Waves and Electromagnetics
Engineered Materials, Dielectrics and Plasmas
Substrates
Yttrium barium copper oxide
Buffer layers
Metals
Methanol
Crystals
Chemicals
Buffer layer
chemical solution deposition
coated conductor
thin film
titanate
Language
ISSN
1051-8223
1558-2515
2378-7074
Abstract
Chemical solution deposition (CSD) approach was introduced in this work to simplify and to optimize the trifluoracetic based M TiO 3 ( M TO, M = Ca, Sr, and Ba) precursor solution, leading to the high shelf-life and the purity. Growing these M TO solutions on (100) LaAlO 3 single-crystal substrates yields (h00) oriented and dense M TO buffer layers. Whereas it is clear that the roughness of M TO films and the lattice mismatch between M TO buffer layer and superconducting YBa 2 Cu 3 O 7-δ film is crucial for the film formation.