학술논문

Technology path to the industrial production of highly efficient and thin c-Si solar cells
Document Type
Conference
Source
3rd World Conference onPhotovoltaic Energy Conversion, 2003. Proceedings of Photovoltaic energy conference Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on. 2:1451-1454 Vol.2 2003
Subject
Photonics and Electrooptics
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Power, Energy and Industry Applications
Production
Photovoltaic cells
Plasma applications
Plasma materials processing
Etching
Dielectrics
Passivation
Surface texture
Legged locomotion
Charge carrier lifetime
Language
Abstract
Higher efficiencies and thinner wafers are the most prominent approaches in solar cell technology to significantly reduce the Wp-price. Plasma etching, dielectric passivation, fast thermal and laser processing have been identified as key technologies to reach these targets. This paper gives an up-to-date overview of the achievements in improving and upscaling these technologies at Fraunhofer ISE. A complete dry and in-line solar cell process with a textured front and passivated surfaces is proposed. A key to this process is the laser fired contact technology, which has been successfully transferred to a new system, enabling laser process times of just a few seconds while maintaining efficiencies of 21% on high-efficiency cell structures. In-line diffusion using the walking string transport yields higher carrier lifetimes in comparison to the standard metal belt systems enabling highly-efficient cell processing.