학술논문

Microfabrication of lead-free (K, Na)NbO3 piezoelectric thin films by dry etching
Document Type
Conference
Source
2013 Transducers & Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII) Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on. :1051-1054 Jun, 2013
Subject
Computing and Processing
Engineering Profession
General Topics for Engineers
Geoscience
Nuclear Engineering
Plasmas
Silicon
Micromachining
Lead
Dry etching
Electrodes
MEMS
Lead-free piezoelectric thin film
Sodium potassium niobate
Language
ISSN
2159-547X
2164-1641
Abstract
In this study, we propose a practical microfabrication method of lead-free sodium potassium niobate [(K, Na)NbO 3 , KNN] thin films by dry etching for the first time. We found that Ar/C 4 F 8 plasma etching was very effective for high etching rate of KNN thin film as well as excellent selectivity of KNN and Cr metal mask. We successfully fabricated unimorph micro-cantilevers of KNN thin films without process damage and confirmed excellent piezoelectric properties of the microfabricated KNN thin film. These results indicate that Ar/C 4 F 8 plasma etching enables to fabricate various lead-free piezoelectric MEMS applications.