학술논문

Thermal Considerations on RF Reliability and Aging in SOI CMOS Based Power Amplifiers
Document Type
Conference
Source
2024 IEEE International Reliability Physics Symposium (IRPS) International Reliability Physics Symposium (IRPS), 2024 IEEE. :1-6 Apr, 2024
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Engineering Profession
Radio frequency
Temperature dependence
Power amplifiers
Voltage
Reliability engineering
Junctions
Time-domain analysis
RF aging
Power Amplifier
SOI
mmWave
lifetime
Language
ISSN
1938-1891
Abstract
The thermal behavior and its effect on RF large signal aging is extensively studied using a QFN-packaged 22FDX Power Amplifier (PA). While no strong dependence due to temperature on t0 RF metrics is seen, DC Iddq increases in the linear region with no significant change in the compression region. RF long term aging at three different V DD and junction temperature TJ is also studied under an accelerated state. Thermal characterization is performed, and junction temperatures are extracted using TCAD-based thermal modeling. These results also validate ambient TA vs T J correlation at P diss . Time domain peak voltage swings at different T J demonstrate that Hot Carrier Injection (HCI) and off-state TDDB are key degradation mechanisms, with voltage as primary and temperature as secondary acceleration parameters demonstrating excellent thermal behavior for SOI based Power Amplifiers.