학술논문

Imaging Flux Avalanches in V$_3$Si Superconducting Thin Films
Document Type
Periodical
Source
IEEE Transactions on Applied Superconductivity IEEE Trans. Appl. Supercond. Applied Superconductivity, IEEE Transactions on. 29(5):1-4 Aug, 2019
Subject
Fields, Waves and Electromagnetics
Engineered Materials, Dielectrics and Plasmas
Temperature measurement
Magnetic resonance imaging
Superconducting magnets
Substrates
Thickness measurement
Magnetization
Flux avalanches
+%24%5F3%24<%2Ftex-math>+<%2Finline-formula>Si+film%22">V $_3$ Si film
superconductivity
thickness gradient
Language
ISSN
1051-8223
1558-2515
2378-7074
Abstract
When developing superconducting devices patterned on thin films, one should bear in mind that flux avalanches might occur for some materials at a certain window of applied fields and temperatures. Although the A15 superconductors are well known and used in a variety of purposes, there are no studies about flux avalanches in V$_3$Si thin films. In the present work, we report the observation of flux avalanches in films of V$_3$Si, grown by pulsed laser deposition on a LaAlO$_3$ substrate. The range of temperatures and applied magnetic fields at which the avalanches take place is determined using dc-magnetometry. Magneto-Optical Imaging is employed to visualize the occurrence and spatial distribution of such flux avalanches. Images of the flux penetrated into the samples indicate a clear anisotropic distribution, which is ascribed to a thickness gradient. The observation of flux avalanches reported here implies that attention to this feature must be given when films of V$_3$Si are envisaged for possible applications.