학술논문

TID response of PD-SOI FinFET with high-k isolation
Document Type
Conference
Source
2022 IEEE 19th India Council International Conference (INDICON) India Council International Conference (INDICON), 2022 IEEE 19th. :1-4 Nov, 2022
Subject
Communication, Networking and Broadcast Technologies
Components, Circuits, Devices and Systems
Computing and Processing
Photonics and Electrooptics
Power, Energy and Industry Applications
Robotics and Control Systems
Signal Processing and Analysis
Silicon compounds
Degradation
Performance evaluation
FinFETs
Threshold voltage
Dielectrics
Hafnium compounds
PD-SOI
isolation dielectric
TID
radiations
Language
ISSN
2325-9418
Abstract
Total ionizing dose response of PD-SOI FinFET is studied for HfO 2 and SiO 2 isolation dielectric layer for dose rates of 100 to 500 krad. Comparison of I DS -V GS curve for low-k and high-k isolation dielectric and its TID response is also done in this article. The current ratio and fixed charges variation is also studied. The PD-SOI FinFET with SiO 2 isolation dielectric is observed to be highly sensitive to radiation. The device with high-k isolation dielectric shows better performance after TID. The degradation is minimum for high dose rates. Hence, it can be used for further application in space environment.