학술논문

Sensitivity enhancement in SGOI nanowire biosensor fabricated by top surface passivation
Document Type
Conference
Source
2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS) Nano/Micro Engineered and Molecular Systems (NEMS), 2012 7th IEEE International Conference on. :579-582 Mar, 2012
Subject
Components, Circuits, Devices and Systems
Computing and Processing
Bioengineering
Communication, Networking and Broadcast Technologies
Signal Processing and Analysis
Oxidation
Nanoelectromechanical systems
Silicon germanium
Biosensors
Atomic layer deposition
Passivation
SiGe-on-Insulator
bio-sensor
passivation
Language
Abstract
Increasing the fraction of Ge in SiGe-on-Insulator (SGOI) using Ge condensation by oxidation significantly increases hole mobility. This effect can be exploited to improve the sensitivity of SGOI nanowire. However, our previous studies found that the sensitivity of an SGOI nanowire is degraded as the Ge fraction increases over 20%, because of the surface state of SiGe is unstable when the Ge fraction is high. In this work, a top surface passtivation SiO 2 layer was deposited on an Si 0.8 Ge 0.2 nanowire and successfully improve its sensitivity around 1.3 times that of the nanowire sample without top a passivation layer.