학술논문

Carrier Concentration Analysis in 1.2 kV SiC Schottky Diodes Under Current Crowding
Document Type
Periodical
Source
IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 43(6):938-941 Jun, 2022
Subject
Engineered Materials, Dielectrics and Plasmas
Components, Circuits, Devices and Systems
Measurement by laser beam
Laser beams
Current measurement
Proximity effects
Silicon carbide
Semiconductor process modeling
Doping profiles
IIR-LD
current crowding
SiC Schottky diode
plasma-optical coefficient
filamentary conduction
Language
ISSN
0741-3106
1558-0563
Abstract
Die-level current crowding phenomena are analyzed at the microsecond timescale with an internal IR-Laser Deflection set-up. To this end, the 4H-SiC plasma-optical coefficient for the refractive index is reported for the first time. A SiC Schottky diode with an edge termination based on a junction termination extension is used as a test vehicle. Under biasing conditions, the edge termination starts a local bipolar conduction along the device active area perimeter, leading to current crowding effects. Using refractive index measurements, a depth-resolved carrier profile is extracted and assessed using both, simulation and Free Carrier Absorption measurements.