학술논문
Investigation of surface properties on Indium Thin Oxide films modified by MirroTron Sputtering system
Document Type
Conference
Author
Source
24th ISDEIV 2010 Discharges and Electrical Insulation in Vacuum (ISDEIV), 2010 24th International Symposium on. :509-512 Aug, 2010
Subject
Language
ISSN
1093-2941
Abstract
Indium Tin Oxide (ITO) film is evaporated on the PEN film using MirrorTron Sputtering system, which is a new sputtering system enabling sputter deposition at a low temperature, separating a sputtering chamber and a deposition chamber. As a result, a uniform ITO thin-film deposition with a film thickness of 150 nm is enabled. This ITO thin-film is chemically analyzed using Focused ion beam and X-ray photoelectron spectroscopy. As a result, good thin-film condition is confirmed.