학술논문

A Compact Formulation for Avalanche Multiplication in SiGe HBTs at High Injection Levels
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 66(1):264-270 Jan, 2019
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Silicon germanium
Doping
Impact ionization
Silicon
Heterojunction bipolar transistors
Semiconductor process modeling
Avalanche
compact model
high injection
impact ionization
kirk effect
safe operating area (SOA)
silicon-germanium heterojunction bipolar transistors (SiGe HBTs)
Language
ISSN
0018-9383
1557-9646
Abstract
This paper presents a unified physical formulation for the avalanche effect in silicon-germanium heterojunction bipolar transistors (SiGe HBTs) at different injection levels. Based on an analytical description of the resulting electric-field distribution, a closed-form analytical expression for the multiplication factor is derived and has been implemented in the HICUM compact model. The model accuracy close to and beyond the common-emitter breakdown voltage BV CEO has been assessed over a wide temperature range in comparison to measurements of SiGe HBTs with different collector doping profiles and emitter geometries.