학술논문

Kinetic Velocity Model to Account for Ballistic Effects in the Drift-Diffusion Transport Approach
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 64(11):4599-4606 Nov, 2017
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Kinetic theory
Mathematical model
Semiconductor device modeling
Indium gallium arsenide
Ballistic transport
MOSFET
Ballistic mobility
drift diffusion (DD)
Fermi–Dirac statistics
InGaAs
kinetic velocity
silicon
technology computer-aided design (TCAD)
thermal velocity
Language
ISSN
0018-9383
1557-9646
Abstract
This paper proposes a novel kinetic velocity model (KVM) for the drift-diffusion (DD) transport approach to describe ballistic effects. It also presents a simulation study of the ballistic effect in short-channel InGaAs and silicon FETs. Monte Carlo and subband Boltzmann transport equation results as well as DD simulations using the simple gate length-dependent ballistic mobility proposed in the literature and the KVM model are compared and discussed. Basic concepts, such as the Matthiessen rule and Fermi-Dirac statistics, are analyzed with a view on ballistic transport in devices in the linear and saturation regimes.